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Semiconductor Products
both front-end and back-end tools for advanced semiconductor research and manufacturing. From e-beam lithography systems and FE-SEMs used to write high precision masks, reticles, and wafers…to FIB/SEM solutions for high throughput, cross-section imaging…to defect review tools designed for rapid analysis…JEOL semiconductor equipment meets the increasingly sophisticated needs of fabs and research laboratories.
The JBX-3040MV series is an electron beam lithography system for mask/reticle fabrication that meets the design rule of 60 to 45 nm. This system features pattern writing with high speed, high accuracy and high reliability, achieved by high-end...
The new JBX-5500FS is a cost-effective, high resolution direct write tool that is PC-controlled and simple to use. A spot beam, vector scan system, the JBX-5500FS writes patterns at a minimum line width of 10nm at 50kV.
The JBX-5500FS can...
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